METHOD AND APPARATUS FOR GENERATING RADIATION

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renew...

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Hauptverfasser:	LOOPSTRA, ERIK, STRUYCKEN, ALEXANDER, NIKIPELOV, ANDREY, VAN DRIEËNHUIZEN, BERT, VAN SCHOOT, JAN, BANINE, VADIM, OSORIO OLIVEROS, EDGAR, YAKUNIN, ANDREI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR MULTIPLEX COMMUNICATION NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
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creator	LOOPSTRA, ERIK STRUYCKEN, ALEXANDER NIKIPELOV, ANDREY VAN DRIEËNHUIZEN, BERT VAN SCHOOT, JAN BANINE, VADIM OSORIO OLIVEROS, EDGAR YAKUNIN, ANDREI
description	A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma. La présente invention porte sur un procédé de génération de rayonnement pour un appareil de lithographie. Le procédé consiste à fournir une cible de combustible à renouvellement en continu au niveau d'une position de formation de plasma et diriger un faisceau d'excitation à onde continue vers la position de formation de plasma de telle sorte qu'un combustible dans la cible de combustible à renouvellement en continu est excité par le faisceau d'excitation à onde continue pour générer un plasma générant un rayonnement.
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The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma. La présente invention porte sur un procédé de génération de rayonnement pour un appareil de lithographie. Le procédé consiste à fournir une cible de combustible à renouvellement en continu au niveau d'une position de formation de plasma et diriger un faisceau d'excitation à onde continue vers la position de formation de plasma de telle sorte qu'un combustible dans la cible de combustible à renouvellement en continu est excité par le faisceau d'excitation à onde continue pour générer un plasma générant un rayonnement.</description><language>eng ; fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRIC COMMUNICATION TECHNIQUE ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; MULTIPLEX COMMUNICATION ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ; X-RAY TECHNIQUE</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141106&DB=EPODOC&CC=WO&NR=2014072149A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141106&DB=EPODOC&CC=WO&NR=2014072149A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LOOPSTRA, ERIK</creatorcontrib><creatorcontrib>STRUYCKEN, ALEXANDER</creatorcontrib><creatorcontrib>NIKIPELOV, ANDREY</creatorcontrib><creatorcontrib>VAN DRIEËNHUIZEN, BERT</creatorcontrib><creatorcontrib>VAN SCHOOT, JAN</creatorcontrib><creatorcontrib>BANINE, VADIM</creatorcontrib><creatorcontrib>OSORIO OLIVEROS, EDGAR</creatorcontrib><creatorcontrib>YAKUNIN, ANDREI</creatorcontrib><title>METHOD AND APPARATUS FOR GENERATING RADIATION</title><description>A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma. La présente invention porte sur un procédé de génération de rayonnement pour un appareil de lithographie. Le procédé consiste à fournir une cible de combustible à renouvellement en continu au niveau d'une position de formation de plasma et diriger un faisceau d'excitation à onde continue vers la position de formation de plasma de telle sorte qu'un combustible dans la cible de combustible à renouvellement en continu est excité par le faisceau d'excitation à onde continue pour générer un plasma générant un rayonnement.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC COMMUNICATION TECHNIQUE</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>IRRADIATION DEVICES</subject><subject>MATERIALS THEREFOR</subject><subject>MULTIPLEX COMMUNICATION</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND1dQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAV3Vz9XIM_Tz10hyNHFE8jy9-NhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHh_kYGhiYG5kaGJpaOxsbEqQIASCsmTw</recordid><startdate>20141106</startdate><enddate>20141106</enddate><creator>LOOPSTRA, ERIK</creator><creator>STRUYCKEN, ALEXANDER</creator><creator>NIKIPELOV, ANDREY</creator><creator>VAN DRIEËNHUIZEN, BERT</creator><creator>VAN SCHOOT, JAN</creator><creator>BANINE, VADIM</creator><creator>OSORIO OLIVEROS, EDGAR</creator><creator>YAKUNIN, ANDREI</creator><scope>EVB</scope></search><sort><creationdate>20141106</creationdate><title>METHOD AND APPARATUS FOR GENERATING RADIATION</title><author>LOOPSTRA, ERIK ; STRUYCKEN, ALEXANDER ; NIKIPELOV, ANDREY ; VAN DRIEËNHUIZEN, BERT ; VAN SCHOOT, JAN ; BANINE, VADIM ; OSORIO OLIVEROS, EDGAR ; YAKUNIN, ANDREI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2014072149A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC COMMUNICATION TECHNIQUE</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>IRRADIATION DEVICES</topic><topic>MATERIALS THEREFOR</topic><topic>MULTIPLEX COMMUNICATION</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>LOOPSTRA, ERIK</creatorcontrib><creatorcontrib>STRUYCKEN, ALEXANDER</creatorcontrib><creatorcontrib>NIKIPELOV, ANDREY</creatorcontrib><creatorcontrib>VAN DRIEËNHUIZEN, BERT</creatorcontrib><creatorcontrib>VAN SCHOOT, JAN</creatorcontrib><creatorcontrib>BANINE, VADIM</creatorcontrib><creatorcontrib>OSORIO OLIVEROS, EDGAR</creatorcontrib><creatorcontrib>YAKUNIN, ANDREI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LOOPSTRA, ERIK</au><au>STRUYCKEN, ALEXANDER</au><au>NIKIPELOV, ANDREY</au><au>VAN DRIEËNHUIZEN, BERT</au><au>VAN SCHOOT, JAN</au><au>BANINE, VADIM</au><au>OSORIO OLIVEROS, EDGAR</au><au>YAKUNIN, ANDREI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR GENERATING RADIATION</title><date>2014-11-06</date><risdate>2014</risdate><abstract>A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma. La présente invention porte sur un procédé de génération de rayonnement pour un appareil de lithographie. Le procédé consiste à fournir une cible de combustible à renouvellement en continu au niveau d'une position de formation de plasma et diriger un faisceau d'excitation à onde continue vers la position de formation de plasma de telle sorte qu'un combustible dans la cible de combustible à renouvellement en continu est excité par le faisceau d'excitation à onde continue pour générer un plasma générant un rayonnement.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR MULTIPLEX COMMUNICATION NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
title	METHOD AND APPARATUS FOR GENERATING RADIATION
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