DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING

The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen- containing aromatic compound h...

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Hauptverfasser: MIYAZAKI, SHINJI, DIOSES, D., ALBERTO, PADMANABAN, MUNIRATHNA, NAKASUGI, SHIGEMASA
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creator MIYAZAKI, SHINJI
DIOSES, D., ALBERTO
PADMANABAN, MUNIRATHNA
NAKASUGI, SHIGEMASA
description The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen- containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. Each of E1 to E3 is independently selected from the group consisting of carbon and nitrogen atoms, provided that at least one of them is a nitrogen atom; each of F1 to F3 is independently selected from the group consisting of oxygen and sulfur atoms; each of G1 to G3 is independently selected from the group consisting of a vinyloxy group, a N-methoxymethylamide group and a hydrogen atom, provided that at least one of them is a vinyloxy group or a N- methoxymethylamide group; and each of p1 to p3 is independently selected from integer including 0 provided that at least any two of them are at least 1 or above 1. La présente invention porte sur un agent de réticulation pouvant empêcher la formation de voile à partir d'un revêtement antireflet inférieur et également sur une composition de formation d'un revêtement antireflet inférieur contenant l'agent. L'agent de réticulation est un composé aromatique contenant de l'azote ayant au moins un groupe vinyloxy ou groupe N-méthoxyméthylamide et la composition contient l'agent de réticulation. L'agent de réticulation représenté par la formule (1) peut être produit par réaction d'un composé aromatique contenant de l'azote, d'un composé halogéné ayant un groupe vinyloxy ou groupe N-méthoxyméthylamide et d'un composé basique.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2014049420A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2014049420A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2014049420A33</originalsourceid><addsrcrecordid>eNrjZNBycQ1z9fEPcHTycVVw8g8J8fdVcPQL8dQNcnXzcXUO8QxzVXD2dwzx9HPnYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBoYmBiaWJkYGjsbGxKkCAOmNJZg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING</title><source>esp@cenet</source><creator>MIYAZAKI, SHINJI ; DIOSES, D., ALBERTO ; PADMANABAN, MUNIRATHNA ; NAKASUGI, SHIGEMASA</creator><creatorcontrib>MIYAZAKI, SHINJI ; DIOSES, D., ALBERTO ; PADMANABAN, MUNIRATHNA ; NAKASUGI, SHIGEMASA</creatorcontrib><description>The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen- containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. Each of E1 to E3 is independently selected from the group consisting of carbon and nitrogen atoms, provided that at least one of them is a nitrogen atom; each of F1 to F3 is independently selected from the group consisting of oxygen and sulfur atoms; each of G1 to G3 is independently selected from the group consisting of a vinyloxy group, a N-methoxymethylamide group and a hydrogen atom, provided that at least one of them is a vinyloxy group or a N- methoxymethylamide group; and each of p1 to p3 is independently selected from integer including 0 provided that at least any two of them are at least 1 or above 1. La présente invention porte sur un agent de réticulation pouvant empêcher la formation de voile à partir d'un revêtement antireflet inférieur et également sur une composition de formation d'un revêtement antireflet inférieur contenant l'agent. L'agent de réticulation est un composé aromatique contenant de l'azote ayant au moins un groupe vinyloxy ou groupe N-méthoxyméthylamide et la composition contient l'agent de réticulation. L'agent de réticulation représenté par la formule (1) peut être produit par réaction d'un composé aromatique contenant de l'azote, d'un composé halogéné ayant un groupe vinyloxy ou groupe N-méthoxyméthylamide et d'un composé basique.</description><language>eng ; fre</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HETEROCYCLIC COMPOUNDS ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140530&amp;DB=EPODOC&amp;CC=WO&amp;NR=2014049420A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140530&amp;DB=EPODOC&amp;CC=WO&amp;NR=2014049420A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAZAKI, SHINJI</creatorcontrib><creatorcontrib>DIOSES, D., ALBERTO</creatorcontrib><creatorcontrib>PADMANABAN, MUNIRATHNA</creatorcontrib><creatorcontrib>NAKASUGI, SHIGEMASA</creatorcontrib><title>DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING</title><description>The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen- containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. Each of E1 to E3 is independently selected from the group consisting of carbon and nitrogen atoms, provided that at least one of them is a nitrogen atom; each of F1 to F3 is independently selected from the group consisting of oxygen and sulfur atoms; each of G1 to G3 is independently selected from the group consisting of a vinyloxy group, a N-methoxymethylamide group and a hydrogen atom, provided that at least one of them is a vinyloxy group or a N- methoxymethylamide group; and each of p1 to p3 is independently selected from integer including 0 provided that at least any two of them are at least 1 or above 1. La présente invention porte sur un agent de réticulation pouvant empêcher la formation de voile à partir d'un revêtement antireflet inférieur et également sur une composition de formation d'un revêtement antireflet inférieur contenant l'agent. L'agent de réticulation est un composé aromatique contenant de l'azote ayant au moins un groupe vinyloxy ou groupe N-méthoxyméthylamide et la composition contient l'agent de réticulation. L'agent de réticulation représenté par la formule (1) peut être produit par réaction d'un composé aromatique contenant de l'azote, d'un composé halogéné ayant un groupe vinyloxy ou groupe N-méthoxyméthylamide et d'un composé basique.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBycQ1z9fEPcHTycVVw8g8J8fdVcPQL8dQNcnXzcXUO8QxzVXD2dwzx9HPnYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx4f5GBoYmBiaWJkYGjsbGxKkCAOmNJZg</recordid><startdate>20140530</startdate><enddate>20140530</enddate><creator>MIYAZAKI, SHINJI</creator><creator>DIOSES, D., ALBERTO</creator><creator>PADMANABAN, MUNIRATHNA</creator><creator>NAKASUGI, SHIGEMASA</creator><scope>EVB</scope></search><sort><creationdate>20140530</creationdate><title>DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING</title><author>MIYAZAKI, SHINJI ; DIOSES, D., ALBERTO ; PADMANABAN, MUNIRATHNA ; NAKASUGI, SHIGEMASA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2014049420A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2014</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAZAKI, SHINJI</creatorcontrib><creatorcontrib>DIOSES, D., ALBERTO</creatorcontrib><creatorcontrib>PADMANABAN, MUNIRATHNA</creatorcontrib><creatorcontrib>NAKASUGI, SHIGEMASA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAZAKI, SHINJI</au><au>DIOSES, D., ALBERTO</au><au>PADMANABAN, MUNIRATHNA</au><au>NAKASUGI, SHIGEMASA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING</title><date>2014-05-30</date><risdate>2014</risdate><abstract>The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen- containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. Each of E1 to E3 is independently selected from the group consisting of carbon and nitrogen atoms, provided that at least one of them is a nitrogen atom; each of F1 to F3 is independently selected from the group consisting of oxygen and sulfur atoms; each of G1 to G3 is independently selected from the group consisting of a vinyloxy group, a N-methoxymethylamide group and a hydrogen atom, provided that at least one of them is a vinyloxy group or a N- methoxymethylamide group; and each of p1 to p3 is independently selected from integer including 0 provided that at least any two of them are at least 1 or above 1. La présente invention porte sur un agent de réticulation pouvant empêcher la formation de voile à partir d'un revêtement antireflet inférieur et également sur une composition de formation d'un revêtement antireflet inférieur contenant l'agent. L'agent de réticulation est un composé aromatique contenant de l'azote ayant au moins un groupe vinyloxy ou groupe N-méthoxyméthylamide et la composition contient l'agent de réticulation. L'agent de réticulation représenté par la formule (1) peut être produit par réaction d'un composé aromatique contenant de l'azote, d'un composé halogéné ayant un groupe vinyloxy ou groupe N-méthoxyméthylamide et d'un composé basique.</abstract><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTROGRAPHY
FILLING PASTES
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
title DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING
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