RETICLE CLEANING BY MEANS OF STICKY SURFACE

Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the...

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Bibliographische Detailangaben
Hauptverfasser:	DELMASTRO, PETER, ONVLEE, JOHANNES, MASON, CHRISTOPHER, SINGH, SANJEEV, ALBRIGHT, RONALD
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLEANING CLEANING IN GENERAL COFFEE MILLS DOMESTIC ARTICLES OR APPLIANCES DOMESTIC WASHING OR CLEANING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FURNITURE HOLOGRAPHY HUMAN NECESSITIES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES SPICE MILLS SUCTION CLEANERS IN GENERAL TRANSPORTING
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