APPARATUS AND METHOD TO REDUCE PARTICLES IN ADVANCE ANNEAL PROCESS

Embodiments of the invention generally relate to apparatus and methods of thermal processing of semiconductor substrates using a pellicle to eliminate contamination of an aperture member. The aperture member is disposed between an energy source and a substrate to be processed. The pellicle may be a...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SADE, AMIKAM
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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