DEPOSITION DEVICE CAPABLE OF FORMING PATTERNS

The present invention relates to a deposition device capable of forming patterns. In a device for depositing a source on a substrate, the deposition device capable of forming patterns of the present invention includes: a nozzle part formed with a spray hole for spraying a source at a side of the sub...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, TAE HWAN, RYU, WOON SEON, NAMGOONG, SUNG TAE
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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