SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

Provided are: a semiconductor device which has improved heat dissipation performance by increasing the thickness of a part of the circuit pattern, to which a semiconductor element is joined, within a temperature range where the thermal stress caused by temperature change at the time of joining does...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NISHIZAWA TATSUO, IKEDA YOSHINARI, MOCHIDUKI EIJI, TADA SHINJI
Format: Patent
Sprache:eng ; fre ; jpn
Schlagworte:
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