METHOD FOR FORMING A SUBSTRATE, AND SUBSTRATE FORMED THEREBY

The present invention relates to a method for forming a substrate. The method for forming the substrate comprises the steps of: forming a deposit layer consisting of different materials on a single-crystal substrate; depositing an aluminum (Al) film onto the deposit layer; oxidizing and single-cryst...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KIM, KIUL
Format:	Patent
Sprache:	eng ; fre ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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