SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE

An extreme-ultraviolet (EUV) light source comprising an optic, a target material, mid a laser beam passing through said optic along a beam path to irradiate said target material; The EUV light source further includes a system generating a gas flow directed toward said target material along said beam...

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Bibliographische Detailangaben
Hauptverfasser:	FLEUROV, VLADIMIR, B, ERSHOV, ALEXANDER, I, FOMENKOV, IGOR, V, PARTLO, WILLIAM, N
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	An extreme-ultraviolet (EUV) light source comprising an optic, a target material, mid a laser beam passing through said optic along a beam path to irradiate said target material; The EUV light source further includes a system generating a gas flow directed toward said target material along said beam -path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas fine outputtmg a gas stream into said volume. L'invention concerne une source de lumière ultraviolette extrême (EUV) comprenant un optique, une matière cible, un faisceau laser passant au milieu dudit optique le long d'un chemin de faisceau pour irradier ladite matière cible ; la source de lumière EUV comprend en outre un système générant un flux de gaz dirigé vers ladite matière cible le long dudit chemin de faisceau, ledit système ayant un élément effilé entourant un volume et une pluralité de lignes de gaz, chaque ligne de gaz délivrant en sortie un courant de gaz dans ledit volume.