METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, OPTICAL MASK, AND PHOTOREACTION LAYER
A method for manufacturing a color filter substrate, comprising the steps of: providing a substrate (10); providing a photoreaction layer (20) covered on the substrate (10); providing an optical mask (30) disposed above the photoreaction layer (20); providing different frequency bands of light to ir...
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Format: | Patent |
Sprache: | chi ; eng ; fre |
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Zusammenfassung: | A method for manufacturing a color filter substrate, comprising the steps of: providing a substrate (10); providing a photoreaction layer (20) covered on the substrate (10); providing an optical mask (30) disposed above the photoreaction layer (20); providing different frequency bands of light to irradiate the photoreaction layer (20) through the optical mask (30) to form color resist areas (201, 203, 205) and a black matrix (207) respectively on the photoreaction layer (20). Also disclosed are the optical mask (30) and the photoreaction layer (20) for manufacturing the color filter substrate. The manufacturing method has the advantages of shortening the processing cycle period, and improving aperture ratio and display contrast.
La présente invention concerne un procédé de fabrication d'un substrat de filtre coloré. Le procédé comprend les étapes consistant à : installer un substrat (10) ; installer une couche de photoréaction (20) recouvrant le substrat (10) ; installer un masque optique (30) sur la couche d |
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