SELF CLEANING SOLUTIONS FOR CARBON IMPLANTATION

Compounds and methods for use as source materials for pre-amorphization implantation in the formation of ultra-shallow junctions. Some compounds exhibit self-cleaning Cn (n= 5 - 30) ion source properties wherein each molecule of the compound includes a Cn (n= 5 - 30) ion source portion and a cleanin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MA, CE, KIM, KEEAN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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