DEVICE, SYSTEM AND METHOD FOR USE IN MACHINES FOR ELECTROCHEMICAL PATTERN REPLICATION

A device and method for electrochemical pattern replication, ECPR, is provided. The device comprises;a base;a bottom chuck on a X-Y-Theta stage;and a Z-stage with an attached top chuck, said chucks being configured to hold a master electrode or a substrate;a displacement monitor system for measuring...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	UTTERBAECK, TOMAS, RAYNAUD, NICOLAS, SANTOS, ANTONIO, CHAUVET, JEAN-MICHEL, ROSEN, DANIEL, LINDGREN, LENNART, FREDENBERG, MIKAEL, CAVAZZA, GILBERT, SVENSSON, STEFAN, WIWEN-NILSSON, PETER, MOELLER, PATRIK
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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