METHOD FOR PERFORMING PREVENTATIVE MAINTENANCE IN A SUBSTRATE PROCESSING SYSTEM

A method for performing preventative maintenance in a substrate processing system is described. The method includes diagnosing a level of contamination in a substrate processing system, scheduling a wet clean process when necessary, and scheduling a dry clean process when necessary. The dry clean pr...

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Bibliographische Detailangaben
Hauptverfasser:	CONSIGLIO, STEVEN, P, CLARK, ROBERT, D, WAJDA, CORY
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	A method for performing preventative maintenance in a substrate processing system is described. The method includes diagnosing a level of contamination in a substrate processing system, scheduling a wet clean process when necessary, and scheduling a dry clean process when necessary. The dry clean process may include an ozone cleaning process. L'invention porte sur un procédé d'exécution d'un entretien préventif dans un système de traitement de substrat. Le procédé comprend le diagnostic d'un niveau de contamination dans un système de traitement de substrat, la programmation d'un traitement de nettoyage humide lorsque cela s'avère nécessaire, et la programmation d'un traitement de nettoyage à sec lorsque cela est nécessaire. Le traitement de nettoyage à sec peut comprendre un traitement de nettoyage à l'ozone.