METHANOFULLERENE DERIVATIVES, PHOTORESIST COMPOSITION CONTAINING IT AND METHOD FOR FORMING A RESIST LAYER

The invention provides methanofullerene derivatives having side chains with acid- labile protecting groups and their use as photoresist materials in a photoresist composition, and particularly as positive - tone photoresists. L'invention porte sur certains dérivés de méthanofullerène, ayant des...

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Bibliographische Detailangaben
Hauptverfasser:	ROBINSON, ALEX, PREECE, JON, ANDREW, PALMER, RICHARD
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOUNDS THEREOF ELECTROGRAPHY HOLOGRAPHY INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY NON-METALLIC ELEMENTS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides methanofullerene derivatives having side chains with acid- labile protecting groups and their use as photoresist materials in a photoresist composition, and particularly as positive - tone photoresists. L'invention porte sur certains dérivés de méthanofullerène, ayant des chaînes latérales comprenant des groupes protecteurs labiles en milieu acide. Les dérivés de méthanofullerène peuvent trouver une application comme matières de résine photosensible, et en particulier comme résines photosensibles positives.