A METHOD FOR TREATING A SURFACE OF A SUBSTRATE

The invention relates to a method for treating a surface of a substrate, said method comprising applying a functional chemical onto the surface of the substrate for improving the adhesion of silicon to said substrate. The method further comprises applying said functional chemical in an amount of at...

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Bibliographische Detailangaben
Hauptverfasser:	KOSONEN, HARRI, TANI, PETRI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING IMPREGNATING OR COATING OF PAPER LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PAPER NOT OTHERWISE PROVIDED FOR PAPER-MAKING PERFORMING OPERATIONS PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PRODUCTION OF CELLULOSE PULP COMPOSITIONS SPRAYING OR ATOMISING IN GENERAL TEXTILES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G WORKING-UP
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Beschreibung
Zusammenfassung:	The invention relates to a method for treating a surface of a substrate, said method comprising applying a functional chemical onto the surface of the substrate for improving the adhesion of silicon to said substrate. The method further comprises applying said functional chemical in an amount of at least 5 mg/m2 onto the surface of the substrate by using a steam application beam to form a functional chemical layer on the substrate, which functional chemical comprises double bonds, silane hydride, or vinyl silane reactive groups, or oligomeric or polymeric hydrocarbon or polysiloxane compounds. La présente invention concerne un procédé de traitement d'une surface d'un substrat, ledit procédé comprenant l'application d'un produit chimique fonctionnel sur la surface du substrat afin d'améliorer l'adhérence du silicium audit substrat. Ladite application dudit produit chimique fonctionnel devra, en outre, se faire à hauteur d'au moins 5 mg/m² sur la surface du substrat et fera appel à un faisceau de dépôt en phase vapeur pour former une couche d'un produit chimique fonctionnel sur le substrat, ledit produit chimique fonctionnel comprenant des doubles liaisons, des groupes réactifs de type hydrure de silane ou silane vinylique, ou des composés oligomériques ou polymériques à base d'hydrocarbures ou de polysiloxane.