GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD
A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27,...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | GEBELE, THOMAS KLEIN, STEFAN LEIPNITZ, THOMAS HENRICH, JUERGEN |
| description | A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
La présente invention porte sur un système d'alimentation en gaz (20) pour alimenter en gaz un système de pompage (10), le système de pompage comprenant une pluralité de moyens de pompage (14, 16), le système d'alimentation en gaz comprenant un orifice d'admission de gaz (22) et une pluralité de conduites de gaz (24, 25) en communication fluidique avec l'orifice d'admission de gaz, chacune des conduites ayant un orifice de sortie du gaz (27, 28) qui peut être raccordé de manière fluidique au système de pompage (10), les orifices de sortie du gaz de la pluralité de conduites de gaz pouvant être raccordés en parallèle de manière fluidique au système de pompage et chaque conduite de gaz étant pourvue d'un moyen de réglage de gradient conçu pour donner au moins un gradient de la quantité de gaz fournie au système de pompage. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_WO2010046252A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>WO2010046252A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_WO2010046252A13</originalsourceid><addsrcrecordid>eNrjZIhwdwxWCA4NCPCJVAiODA5x9dVRCAj1DfD0c4fznf0dQ5D5SFp8XUM8_F10FBz9XODaIGI8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-3N_IwNDAwMTMyNTI0dCYOFUAxXoyJA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD</title><source>esp@cenet</source><creator>GEBELE, THOMAS ; KLEIN, STEFAN ; LEIPNITZ, THOMAS ; HENRICH, JUERGEN</creator><creatorcontrib>GEBELE, THOMAS ; KLEIN, STEFAN ; LEIPNITZ, THOMAS ; HENRICH, JUERGEN</creatorcontrib><description>A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
La présente invention porte sur un système d'alimentation en gaz (20) pour alimenter en gaz un système de pompage (10), le système de pompage comprenant une pluralité de moyens de pompage (14, 16), le système d'alimentation en gaz comprenant un orifice d'admission de gaz (22) et une pluralité de conduites de gaz (24, 25) en communication fluidique avec l'orifice d'admission de gaz, chacune des conduites ayant un orifice de sortie du gaz (27, 28) qui peut être raccordé de manière fluidique au système de pompage (10), les orifices de sortie du gaz de la pluralité de conduites de gaz pouvant être raccordés en parallèle de manière fluidique au système de pompage et chaque conduite de gaz étant pourvue d'un moyen de réglage de gradient conçu pour donner au moins un gradient de la quantité de gaz fournie au système de pompage.</description><language>eng ; fre</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100429&DB=EPODOC&CC=WO&NR=2010046252A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100429&DB=EPODOC&CC=WO&NR=2010046252A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GEBELE, THOMAS</creatorcontrib><creatorcontrib>KLEIN, STEFAN</creatorcontrib><creatorcontrib>LEIPNITZ, THOMAS</creatorcontrib><creatorcontrib>HENRICH, JUERGEN</creatorcontrib><title>GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD</title><description>A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
La présente invention porte sur un système d'alimentation en gaz (20) pour alimenter en gaz un système de pompage (10), le système de pompage comprenant une pluralité de moyens de pompage (14, 16), le système d'alimentation en gaz comprenant un orifice d'admission de gaz (22) et une pluralité de conduites de gaz (24, 25) en communication fluidique avec l'orifice d'admission de gaz, chacune des conduites ayant un orifice de sortie du gaz (27, 28) qui peut être raccordé de manière fluidique au système de pompage (10), les orifices de sortie du gaz de la pluralité de conduites de gaz pouvant être raccordés en parallèle de manière fluidique au système de pompage et chaque conduite de gaz étant pourvue d'un moyen de réglage de gradient conçu pour donner au moins un gradient de la quantité de gaz fournie au système de pompage.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIhwdwxWCA4NCPCJVAiODA5x9dVRCAj1DfD0c4fznf0dQ5D5SFp8XUM8_F10FBz9XODaIGI8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-3N_IwNDAwMTMyNTI0dCYOFUAxXoyJA</recordid><startdate>20100429</startdate><enddate>20100429</enddate><creator>GEBELE, THOMAS</creator><creator>KLEIN, STEFAN</creator><creator>LEIPNITZ, THOMAS</creator><creator>HENRICH, JUERGEN</creator><scope>EVB</scope></search><sort><creationdate>20100429</creationdate><title>GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD</title><author>GEBELE, THOMAS ; KLEIN, STEFAN ; LEIPNITZ, THOMAS ; HENRICH, JUERGEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_WO2010046252A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2010</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>GEBELE, THOMAS</creatorcontrib><creatorcontrib>KLEIN, STEFAN</creatorcontrib><creatorcontrib>LEIPNITZ, THOMAS</creatorcontrib><creatorcontrib>HENRICH, JUERGEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GEBELE, THOMAS</au><au>KLEIN, STEFAN</au><au>LEIPNITZ, THOMAS</au><au>HENRICH, JUERGEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD</title><date>2010-04-29</date><risdate>2010</risdate><abstract>A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
La présente invention porte sur un système d'alimentation en gaz (20) pour alimenter en gaz un système de pompage (10), le système de pompage comprenant une pluralité de moyens de pompage (14, 16), le système d'alimentation en gaz comprenant un orifice d'admission de gaz (22) et une pluralité de conduites de gaz (24, 25) en communication fluidique avec l'orifice d'admission de gaz, chacune des conduites ayant un orifice de sortie du gaz (27, 28) qui peut être raccordé de manière fluidique au système de pompage (10), les orifices de sortie du gaz de la pluralité de conduites de gaz pouvant être raccordés en parallèle de manière fluidique au système de pompage et chaque conduite de gaz étant pourvue d'un moyen de réglage de gradient conçu pour donner au moins un gradient de la quantité de gaz fournie au système de pompage.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre |
| recordid | cdi_epo_espacenet_WO2010046252A1 |
| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T17%3A20%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GEBELE,%20THOMAS&rft.date=2010-04-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EWO2010046252A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |