WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY

An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. Th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZENG, WANXUE, SCHAEPKENS, MARC, RUSINKO, DAVID, MICHAEL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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