METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE OXIDE (TCO) FILMS; PROPERTIES AND APPLICATIONS OF SUCH FILMS

A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wh...

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Bibliographische Detailangaben
Hauptverfasser:	TEREN, ANDREW, BENAGLI, STEFANO, WATKINS, OWAN CHARLES, VOGLER, BENJAMIN, MEIER, JOHANNES, SCHNEIDER, STEFAN, BORRELLO, DANIEL, GOSSLA, MARIO, DIMITRY, ZIMIN, RAMOINO, LUCA, KERSCHBAUMER, JOERG, WIDER, JOACHIM, POPPELLER, MARKUS, KROLL, ULRICH, KUHN, HANSJOERG, ZINDEL, ARNO, MARK, ANDREAS, DESPONT, LAURENT, VALLAT-SAUVAIN, EVELYNE
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wherein the gas flow ratio of diethylzinc and water is kept between 0.87 and 1.3 and the gas flow ratio of diborane and diethylzinc is being kept between 0.05 and 0.4. The haze of such manufactured layer, measured as ratio of diffuse transmittance to total transmittance at 600nm, is between 10 and 25%. L'invention concerne un procédé de fabrication d'une couche d'oxyde de zinc dopée au bore, transparente, conductrice à partir d'un substrat. La couche est déposée à partir d'au moins du diéthylzinc, de l'eau et du diborane par dépôt chimique en phase vapeur à basse pression dans une chambre de traitement d'un système de dépôt dans laquelle le débit gazeux de diéthylzinc et d'eau est maintenu entre 0,87 et 1,3 et le débit gazeux de diborane et de diéthylzinc est maintenu entre 0,05 et 0,4. Le voile d'une couche ainsi fabriquée, mesuré en tant que rapport entre le facteur de transmission diffuse et le facteur de transmission total à 600 nm, est compris entre 10 et 25 %.