LOW- INERTIA MULTI -AXIS MULTI -DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM

An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	EIDE, PAUL, FARLEY, MARVIN, SMICK, THEODORE, RYDING, GEOFFREY, HORNER, RONALD, OTA, KAN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ENGINEERING ELEMENTS AND UNITS FRAMES, CASINGS, OR BEDS OF ENGINES OR OTHER MACHINES ORAPPARATUS NOT SPECIFIC TO AN ENGINE, MACHINE, OR APPARATUSPROVIDED FOR ELSEWHERE GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING STANDS OR SUPPORTS THERMAL INSULATION IN GENERAL WEAPONS
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