MULTIPLE AMPOULE DELIVERY SYSTEMS

This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as...

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Bibliographische Detailangaben
Hauptverfasser:	SARIGIANNIS, DEMETRIUS, CHESTERS, STEPHEN, PRYOR, EDWARD, KRAUSE, MICHAEL, JOSEPH, HOOVER, CYNTHIA, A, SPOHN, RONALD
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices. Cette invention porte sur un appareil de distribution de réactif en phase vapeur ou liquide intégré ayant plusieurs récipients et plusieurs collecteurs de distribution de réactif en phase vapeur ou liquide/d'alimentation en gaz support ou inerte, qui peuvent être utilisés pour distribuer en continu des réactifs en phase vapeur ou liquide tels que des précurseurs pour le dépôt de matières dans la fabrication de matériaux et dispositifs semi-conducteurs.