EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY

Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable mat...

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Bibliographische Detailangaben
Hauptverfasser:	LABRAKE, DWAYNE L, MCMACKIN, IAN MATTHEW, JONES, CHRISTOPHER E, PEREZ, JOSEPH G, KHUSNATDINOV, NIYAZ
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified. L'invention porte sur des dispositifs positionnés entre une source d'énergie et un gabarit de lithographie par impression, qui peuvent bloquer une exposition d'énergie sur des parties de matériau polymérisable distribuées sur un substrat. Des parties du matériau polymérisable qui sont bloquées de l'énergie peuvent rester fluides, tandis que le matériau polymérisable restant est solidifié.