WAFER STACK CLEANING

The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HJERTAAS, ERIK, WANG, PER, ARNE, TRONRUD, OLE, CHRISTIAN, SKEIE, ANDRE, TRONRUD, OLA, RAMSLAND, ARNE, HAMMEL, BENT
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES TRANSPORTING WORKING CEMENT, CLAY, OR STONE WORKING STONE OR STONE-LIKE MATERIALS
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Beschreibung
Zusammenfassung:	The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the wafer stack and the nozzle in the stacking direction. L'invention porte sur un dispositif et un procédé destinés au nettoyage en surface de tranches ou substrats individuels agencés en une pile dans un sens d'empilement, un jet de liquide étant envoyé vers la pile dans un sens perpendiculaire au sens d'empilement et un mouvement relatif étant créé entre la pile de tranches et la buse dans le sens d'empilement.