A PROCESS FOR IMAGING A PHOTORESIST COATED OVER AN ANTIREFLECTIVE COATING

The process of the present invention relates to imaging a photoresist film coated over an anti reflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective f...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DIOSES, ALBERTO, D, TIMKO, ALLEN, G, ABDALLAH, DAVID, ZHANG, RUZHI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The process of the present invention relates to imaging a photoresist film coated over an anti reflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing the antireflective film treated with an aqueous rinsing solution, d) forming a coating of a photoresist over the film of the antireflective coating composition, e) imagewise exposing the photoresist film, and, f) developing the photoresist with an aqueous alkaline developing solution. Le procédé de la présente invention porte sur l'imagerie d'un film de photorésist appliqué sur un film de revêtement antireflet. Le procédé consiste à a) former un film de revêtement antireflet à partir d'une composition de revêtement antireflet qui renferme un polymère de siloxane ; b) traiter le film antireflet par une solution de traitement alcaline aqueuse ; c) rincer le film antireflet traité par solution aqueuse de rinçage ; d) former un revêtement d'un photorésist sur le film de composition de revêtement antireflet ; e) exposer par image le film de photorésist ; et f) développer le photorésist avec une solution alcaline aqueuse de développement.