PROCESS FOR PREPARING A DISPERSION COMPRISING TITANIUM-SILICON MIXED OXIDE

Process for preparing an aqueous dispersion which has a pH of 9 to 14 and comprises particles of a pyrogenic titanium- silicon mixed oxide powder having a proportion of silicon dioxide of 75 to 99.99% by weight and of titanium dioxide of 0.01 to 25% by weight, whose mean aggregate diameter in the di...

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Bibliographische Detailangaben
Hauptverfasser:	LORTZ, WOLFGANG, SCHUMACHER, KAI, PIETSCH, JOERG
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F COMPOUNDS THEREOF INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OFSOLID INORGANIC COMPOUNDS INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	Process for preparing an aqueous dispersion which has a pH of 9 to 14 and comprises particles of a pyrogenic titanium- silicon mixed oxide powder having a proportion of silicon dioxide of 75 to 99.99% by weight and of titanium dioxide of 0.01 to 25% by weight, whose mean aggregate diameter in the dispersion is not more than 200 nm, and at least one basic, quaternary ammonium compound. La présente invention concerne un procédé de préparation d'une dispersion aqueuse qui a un pH de 9 à 14 et comprend des particules d'une poudre d'oxyde mixte de silicium et de titane pyrogène ayant une proportion de dioxyde de silicium de 75 à 99,99 % en poids et de dioxyde de titane de 0,01 à 25 % en poids, dont le diamètre moyen des agrégats dans la dispersion est inférieur à 200 nm, et au moins un composé ammonium quaternaire basique.