IMPROVED PLASMA SOURCE

An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magentic means which are strengthened on the downstream end of the first stage, to control the plasma flux...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	CARTER, MARK, D, MCCASKILL, GREG, E, CHANG DIAZ, FRANKLIN, R, GLOVER, TIM, W, SQUIRE, JARED, P, CASSADY, LEONARD, D
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magentic means which are strengthened on the downstream end of the first stage, to control the plasma flux, ionization fraction, spatial distribution. La présente invention concerne une source plasma radiofréquence sans grille comportant un coupleur radiofréquence.