EUV PELLICLE WITH INCREASED EUV LIGHT TRANSMITTANCE

According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle (106) for protecting a lithographic mask (104) includes an aerogel film (122). The pellicle further includes a frame (124) for mounting the aerogel film over the lithographic mask. The aerogel film causes the pellicle to ha...

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Bibliographische Detailangaben

Hauptverfasser:	RYOUNG-HAN, KIM, WOOD, OBERT, REEVES, II, WALLOW, THOMAS
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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