CONTACT ELECTRODE FOR MICRODEVICES AND ETCH METHOD OF MANUFACTURE

A contact electrode for a device is made using an etching process to etch the surface of the contact electrode to form a corrugated contact surface wherein the outer edges of at least one grain is recessed from the outer edges of adjecent grains and is recessed by at least about 0.05 µm from the con...

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Bibliographische Detailangaben
Hauptverfasser: THOMPSON, DOUGLAS, L, PARANJPYE, ALOK
Format: Patent
Sprache:eng ; fre
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