LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus is disclosed that includes a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table (WT) constructed to hold...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WIJCKMANS, MAURICE, WILLEM, JOZF, ETIENNE, FRANKEN, DOMINICUS, JACOBUS, PETRUS, ADRIANUS, JANSEN, BASTIAAN, STEPHANUS, HENDRICUS, VAN DIJSSELDONK, ANTONIUS, JOHANNES, JOSEPHUS, GROENEVELD, ROGIER, HERMAN, MATHIJS, DE JONGH, ROBERTUS, JOHANNES, MARINUS, VAN DER WIJST, MARC, WIHELMUS, MARIA
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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