MANUFACTURING METHODS OF FINE CERIUM OXIDE PARTICLES AND ITS SLURRY FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR

The present invention relates to manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor. To increase of the removal selectivity, an aqueous solution of additives consists of polyacrylic acid and amine compounds is added the cerium ox...

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Bibliographische Detailangaben
Hauptverfasser:	SOH, SOON-YOUNG, HAHN, YOUNG-SIK, MYEONG, WAN-JAE, JUNG, MAN-WOO, LEE, JOO-HYEONG, NAM, HO-SEONG, LEE, JIN-SEO, AHN, GUI-RYONG
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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