REAL TIME LEAK DETECTION SYSTEM OF PROCESS CHAMBER

Provided is a technology for detecting a leak of a process chamber in real time generated from a semiconductor substrate manufacturing process using an apparatus using plasma in a vacuum state. The real time leak detection system of a process chamber can detect a leak through end point detection (EP...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	WOO, BONG-JOO
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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