CMOS INTEGRATED PROCESS FOR FABRICATING MONOCRYSTALLINE SILICON MICROMECHANICAL ELEMENTS BY POROUS SILICON MICROMACHINING AND SENSOR CHIP COMPRISING SUCH ELEMENT

The invention relates to a process for fabricating a monocrystalline silicon micromechanical element integrated with a CMOS circuit element within the CMOS technology. A portion of the surface layer of a monocrystalline substrate is selectively doped and a CMOS circuit element is fabricated within t...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DUECSOE, CSABA, EROES, MAGDOLNA, ADAM, ANTALNE, MOHACSY, TIBOR, VAZSONYI, EVA, BARSONY, ISTVAN, PAYER, KAROLYNE
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRICITY HANDLING RECORD CARRIERS MEASURING MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PHYSICS PRESENTATION OF DATA PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS RECOGNITION OF DATA RECORD CARRIERS TESTING TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!