OBJECTIVE, IN PARTICULAR PROJECTION OBJECTIVE FOR SEMICONDUCTOR LITHOGRAPHY

An objective, in particular a projection objective in semiconductor lithography, having an optical axis (z-axis) is provided with optical elements (20) mounted in an objective housing (10). At least one optical element is mounted in an inner part connected to an outer part (21) via an intermediate p...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	RIEF, KLAUS
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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