CHEMICAL AND MECHANICAL POLISHING COMPOSITION AND ITS USES

A chemical and mechanical polishing composition comprises at least one abrasive particle and at least one carrier, and further comprises at least one metal corrosive inhibitors. The use of the chemical and mechanical polishing composition in polishing metal is disclosed too. The present composition...

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Bibliographische Detailangaben
Hauptverfasser:	SHIAO, DANNY, ZHENGLONG, JING, JUDY, JIANFEN, YANG, ANDY, CHUNXIAO
Format:	Patent
Sprache:	chi ; eng ; fre
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	A chemical and mechanical polishing composition comprises at least one abrasive particle and at least one carrier, and further comprises at least one metal corrosive inhibitors. The use of the chemical and mechanical polishing composition in polishing metal is disclosed too. The present composition can largely reduce the defects of metal surface, reduce removal rate of metal, and improve the smoothness of metal surface significantly. L'invention concerne une composition de polissage chimique et mécanique comprenant au moins une particule abrasive et un véhicule, et comprenant en outre au moins un inhibiteur de corrosion métallique. L'invention concerne également l'utilisation de cette composition de polissage chimique et mécanique pour polir des métaux. Cette composition permet de réduire de manière importante les défauts à la surface des métaux, de réduire le taux de métal retiré, et d'améliorer de manière significative le poli de la surface des métaux.