NANSOSCALE PATTERNING AND FABRICATION METHODS

The invention disclosed relates to the formation of patterns on the surface of a substrate prepared by the deposition of clusters through a shadow-mask. In a preferred form the pattern is nanoscale and comprises an electrical connection between contacts on the substrate. L'invention concerne la...

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Bibliographische Detailangaben
Hauptverfasser:	BROWN, SIMON, ANTHONY, PARTRIDGE, JAMES, GORDON, MACKENZIE, DAVID, MICHAEL, ANGUS
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention disclosed relates to the formation of patterns on the surface of a substrate prepared by the deposition of clusters through a shadow-mask. In a preferred form the pattern is nanoscale and comprises an electrical connection between contacts on the substrate. L'invention concerne la formation de motifs sur la surface d'un substrat préparé par dépôt d'agrégats via un masque perforé. Dans une forme préférée, le motif est de l'ordre du nanomètre et comprend une connexion électrique entre des contacts disposés sur le substrat