HIGH EFFICIENCY TRAP FOR DEPOSITION PROCESS

The present invention provides a system, apparatus and method for improving the efficiency of a semiconductor processing system, such as a deposition system by decreasing or substantially eliminating the accumulation of by-products in the apparatus components of the semiconductor processing system....

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	HOGLE, RICHARD
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a system, apparatus and method for improving the efficiency of a semiconductor processing system, such as a deposition system by decreasing or substantially eliminating the accumulation of by-products in the apparatus components of the semiconductor processing system. The present invention further relates to improving the efficiency of a foreline trap associated with a semiconductor processing system, wherein the trap removes substantially all of the by-products from the exhaust gas from the processing chamber, m addition, the present invention provides a system, apparatus and method for efficiently clearing traps of accumulated by-products from exhaust gas of a semiconductor processing system. L'invention concerne un système, un dispositif et un procédé permettant d'améliorer le rendement d'un système de traitement de semi-conducteurs tel qu'un système de dépôt, et qui consistent à réduire ou à éliminer sensiblement l'accumulation de coproduits dans les composants du système de traitement de semi-conducteurs. Elle vise en outre à améliorer l'efficacité d'un piège préliminaire associé à un système de traitement de semi-conducteurs, le piège permettant d'éliminer sensiblement tous les coproduits provenant des gaz d'échappement de la chambre de traitement. L'invention concerne en outre un système, un dispositif et un procédé permettant de nettoyer efficacement les pièges des coproduits accumulés provenant des gaz d'échappement du système de traitement de semi-conducteurs.