SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD THEREOF

[PROBLEMS] To provide a single-substrate cleaning apparatus which saves space and is low-cost and environment-friendly, and a cleaning method employed in such apparatus. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning apparatus (1) is provided with a rotating table (50) for rotatably holding a sil...

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Bibliographische Detailangaben
Hauptverfasser:	SOTOAKA, RYUJI, AZUMA, TOMOYUKI, FURUSAWA, KENJI, GOTO, HIDETO, JOYA, SATOSHI, TANAKA, KEIICHI, KIMURA, YOSHIYA
Format:	Patent
Sprache:	eng ; fre ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PRINTED CIRCUITS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	[PROBLEMS] To provide a single-substrate cleaning apparatus which saves space and is low-cost and environment-friendly, and a cleaning method employed in such apparatus. [MEANS FOR SOLVING PROBLEMS] A substrate cleaning apparatus (1) is provided with a rotating table (50) for rotatably holding a silicon substrate; a light irradiation apparatus (30) which can irradiate at least a part of the surface of the silicon substrate being held with light; a nozzle (40) which can selectively supply the substrate with at least a N2O solution and a hydrofluoric solution; and a control unit which controls supply from the light irradiation apparatus (30) and the nozzle (40) and permits the light irradiation by the light irradiation apparatus (30) when the silicon substrate is supplied with the N2O solution. L'invention porte sur un appareil de nettoyage de substrat simple, moins encombrant, plus économique et sans danger pour l'environnement, de même qu'un procédé de nettoyage employé dans ledit appareil. Elle concerne un appareil de nettoyage de substrat (1) pourvu d'une table rotative (50) permettant de maintenir en rotation un substrat de silicium ; un appareil d'irradiation de lumière (30) capable d'irradier au moins une partie de la surface du substrat de silicium étant maintenu avec de la lumière ; une buse (40) pouvant alimenter de manière sélective le substrat avec au moins une solution N2O et une solution fluorhydrique ; et une unité de commande dosant l'alimentation de l'appareil d'irradiation de lumière (30) et de la buse (40) et permettant l'irradiation de lumière par l'appareil d'irradiation de lumière (30) lorsque le substrat de silicium reçoit la solution N2O.