SINGLE MASK MIM CAPACITOR AND RESISTOR WITH IN TRENCH COPPER DRIFT BARRIER

The formation of a MIM (metal insulator metal) capacitor (164) and concurrent formation of a resistor (166) is disclosed. A copper diffusion barrier is formed over a copper deposition (110) that serves as a bottom electrode (170) of the capacitor (164). The copper diffusion barrier mitigates unwante...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BRENNAN, KENNETH, D, SOLOMENTSEV, YURI, E, RAO, SATYAVOLU, SRINIVAS, PAPA, JOSHI, SOMIT, LEAVY, MONTRAY, GRUNOW, STEPHAN, MATZ, PHILLIP, D, CRENSHAW, DARIUS, LAMMONT, AJMERA, SAMEER, KUMAR
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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