BUILDING UP DIFFRACTIVE OPTICS BY STRUCTURED GLASS COATING

The invention relates to optical parts, and in particular to a process for applying an optically active structuring (7) to a substrate (1), and also to a component produce using a process of this type. The process for applying an optically active structuring to a substrate comprises in particular ph...

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Bibliographische Detailangaben
Hauptverfasser:	MUND, DIETRICH, HAMMERL, KLAUS, MICHAEL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	The invention relates to optical parts, and in particular to a process for applying an optically active structuring (7) to a substrate (1), and also to a component produce using a process of this type. The process for applying an optically active structuring to a substrate comprises in particular photolithographic techniques and the deposition of material via physical vapor deposition processes. Cette invention concerne des pièces optiques et, en particulier, un procédé pour appliquer une structure optiquement active (7) sur un substrat (1), ainsi qu'un composant produit au moyen d'un procédé de ce type. Ce procédé, qui sert à appliquer une structure optiquement active sur un substrat, utilise notamment des techniques de photolithographie et le dépôt de matière par les techniques de dépôt en phase vapeur par procédé chimique.