DOUBLE LAYER TRANSPARENT CONDUCTOR SCHEME HAVING IMPROVED ETCHING PROPERTIES FOR TRANSPARENT ELECTRODES IN ELECTRO-OPTIC DISPLAYS

A double layer transparent conductor scheme suitable for fabricating transparent electrodes in flat panel displays (LCD, ELD, Plasma Displays, LED OLED), touch panels, optical filters, solar cells and other applications is presented. The upper layer typically consists of Indium Tin Oxide (ITO) and t...

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Bibliographische Detailangaben
Hauptverfasser:	HSU, IRWIN, HSU, PETER (FANGYUN), BOEHM, EDGAR, CHEN, WORTHY
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A double layer transparent conductor scheme suitable for fabricating transparent electrodes in flat panel displays (LCD, ELD, Plasma Displays, LED OLED), touch panels, optical filters, solar cells and other applications is presented. The upper layer typically consists of Indium Tin Oxide (ITO) and the much thinner lower layer typically consists of Al2O3-doped Zinc Oxide (AZO) or Gallium Oxide-doped ZnO (GZO) or both Al2O3 and Ga2O3 doped ZnO (AGZO). The lower layer has significantly higher wet chemical etch rate than the uper layer, allowing faster, more uniform etching of the upper ITO layer, thus preventing the formation of ITO "islands". L'invention concerne un schéma conducteur transparent double couche destiné à la fabrication d'électrodes transparentes dans des écrans plats (LCD, ELD, écrans plasma, DEL, OLED), écrans tactiles, filtres optiques, cellules solaires et autres applications. La couche supérieure est généralement composée d'oxyde d'étain et d'indium (ITO) et la couche inférieure la plus fine est généralement composée d'oxyde de zinc dopé à l'Al2O3 (AZO) ou de ZnOP dopé à l'oxyde de gallium (GZO) ou de ZnO dopé à l'Al2O3 et au Ga2O3 (AGZO). La couche inférieure présente un taux de gravure humide notablement plus élevé que la couche supérieure, ce qui permet d'assurer une gravure plus rapide et plus uniforme de la couche d'ITO supérieure, et d'éviter ainsi la formation d' /= ITO.