IMPRINTING METHOD FOR MAKING PHOTONIC STRUCTURES

Photonic crystal structures are made by a method including steps of providing a substrate (S10), depositing a multilayer stack of substantially identical planar layers (S20), each planar layer comprising two or more sublayers, depositing (S50) and patterning (S60) a layer of imprintable material by...

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Bibliographische Detailangaben
Hauptverfasser:	STASIAK, JAMES, PETERS, KEVIN, F, COULMAN, DONALD, J, CRUZ-URIBE, TONY, CHAMPION, DAVID
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Photonic crystal structures are made by a method including steps of providing a substrate (S10), depositing a multilayer stack of substantially identical planar layers (S20), each planar layer comprising two or more sublayers, depositing (S50) and patterning (S60) a layer of imprintable material by imprinting, and etching a regular array of openings through the multilayer stack (S70). L'invention porte sur des structures photoniques cristallines obtenues selon un procédé consistant à former un substrat (S10), déposer une pile multicouche de couches planes sensiblement identiques (S20), chaque couche plane comprenant au moins deux sous-couches, déposer (S50) et modeler (S60) une couche de matériau imprimable par impression et gravure d'un réseau régulier d'orifices dans la pile multicouche (S70).