METHOD OF LACQUERING SEMICONDUCTOR SUBSTRATES

The invention provides a method of lacquering substrates, in particular semiconductor substrates, whose surfaces have three-dimensional topographies. For this purpose, the substrate is sprayed with a lacquer that is modified with a solvent, and subsequently the applied lacquer layer is homogenized i...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	HOEPPNER, JUERGEN
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!