METHOD AND SYSTEM FOR DRYING A SUBSTRATE

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the ba...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HO, CHUNG-PENG, YOSHIOKA, KAZ, NAFUS, KATHLEEN, YAMAGUCHI, RICHARD
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BLASTING CINEMATOGRAPHY DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HEATING HOLOGRAPHY IRRADIATION DEVICES LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR WEAPONS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the baking process. This interaction has been shown to cause non-uniformity in critical dimension for the pattern formed in the thin film following the developing process. La présente invention concerne un procédé et un système permettant de sécher un film mince sur un substrat après une lithographie à immersion liquide. Le séchage du film mince qui à pour but d'éliminer le fluide d'immersion est effectué avant cuisson dudit film mince, ce qui permet de réduire d'éventuelles interactions du fluide d'immersion avec le processus de cuisson. En effet, une telle interaction provoque une irrégularité de la dimension critique du motif formé dans le film mince après le processus de développement.