METHOD OF PRODUCING NANOPARTICLES USING A EVAPORATION-CONDENSATION PROCESS WITH A REACTION CHAMBER PLASMA REACTOR SYSTEM

The present invention provides a method and apparatus for the controlled synthesis of nanoparticles using a high temperature process. The reactor chamber includes a high temperature gas heated by means such as a plasma torch, and a reaction chamber. The homogenizer includes a region between the reac...

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Bibliographische Detailangaben
Hauptverfasser:	DE LA VEAUX, STEPHAN, CLAUDE, ZHANG, LU
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F FERROUS OR NON-FERROUS ALLOYS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OFSOLID INORGANIC COMPOUNDS INORGANIC CHEMISTRY MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MANUFACTURE OR TREATMENT THEREOF MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POWDER METALLURGY PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	The present invention provides a method and apparatus for the controlled synthesis of nanoparticles using a high temperature process. The reactor chamber includes a high temperature gas heated by means such as a plasma torch, and a reaction chamber. The homogenizer includes a region between the reactant inlets and the plasma (the spacer zone) to ensure that feeds from the reactant inlets are downstream of the recirculation zone induced by the high temperature gas. It also includes a region downstream of the reactant inlets that provides a nearly 1 dimensional (varying only in the axial direction) flow and concentration profile in the reaction zone to produce nanoparticles with narrow size distribution. La présente invention concerne un procédé et un appareil pour la synthèse régulée des nanoparticules par l'utilisation d'un processus à haute température. La chambre du réacteur contient un gaz à haute température, chauffé par un moyen tel qu'une torche à plasma, et une enceinte de réaction. L'homogénéiseur comporte une région entre les admissions de réactif et le plasma (zone d'espacement) afin d'assurer que les alimentations des admissions de réactif sont en aval de la zone de recyclage induite par le gaz à haute température. Il inclut également une région en aval des admissions de réactif qui constitue presque un écoulement unidimensionnel (changeant seulement dans la direction axiale) et un profil de concentration dans la zone de réaction afin de produire des nanoparticules de distribution de taille étroite.