IMPROVED LARGE AREA SOURCE FOR UNIFORM ELECTRON BEAM GENERATION

An electron beam apparatus that includes a vacuum chamber, a large-area cathode disposed in the vacuum chamber, and a first power supply connected to the cathode. The first power supply is configured to apply a negative voltage to the cathode sufficient to cause the cathode to emit electrons toward...

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Bibliographische Detailangaben
Hauptverfasser: ZHAO, JUN, LIVESAY, WILLIAM, R, WOODS, SCOTT, C, PONNEKANTI, HARI, K, ARMER, HELEN, R, DEMOS, ALEXANDROS, T
Format: Patent
Sprache:eng ; fre
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