PROCESS AND MATERIALS FOR FORMATION OF PATTERNED FILMS OF FUNCTIONAL MATERIALS

The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SINTA, ROGER, F, CERNIGLIARO, GEORGE, J
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BEER BIOCHEMISTRY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS THEREOF CULTURE MEDIA DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ENZYMOLOGY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR METALLURGY MICROBIOLOGY MICROORGANISMS OR ENZYMES MUTATION OR GENETIC ENGINEERING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC CHEMISTRY ORIGINALS THEREFOR PEPTIDES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROPAGATING, PRESERVING OR MAINTAINING MICROORGANISMS SEMICONDUCTOR DEVICES SPIRITS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF VINEGAR WINE
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Beschreibung
Zusammenfassung:	The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler is one that is essentially transparent to activating radiation. Once formed, the coating is exposed to activating radiation in an image pattern and developed to form the patterned layer of functional material. The organic components of the coating can be removed if desired. L'invention concerne un procédé et une composition destinés à former une ou plusieurs couches de matériau fonctionnel à motifs sur un substrat. Ce procédé consiste à produire une composition de revêtement comportant un matériau de photomodélisation qui contient une charge particulière de matériau fonctionnel. Cette charge est essentiellement transparente au rayonnement d'activation. Une fois formé, le revêtement est exposé au rayonnement d'activation dans un motif d'image et développé de manière à former une couche de matériau fonctionnel à motifs. Les composants organiques du revêtement peuvent être retirés, si désiré.