SILOXANE-CONTAINING COMPOSITIONS CURABLE BY RADIATION TO SILICONE ELASTOMERS

This invention provides for compositions, which can be crosslinked by radiation to give elastomeric coatings, which comprises: (a) high-molecular weight siloxanes with multiple (meth)acrylate functional groups; and (b) reinforcing fillers selected from the group consisting of silicone resins and sil...

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Hauptverfasser:	SIMPELKAMP, JOERG, HOHENWARTER, THOMAS, E, LERSCH, PETER, ALLEN, JOHN, MOORE, ERNEST, D, DAWN PAEZ, ANGELA, SMITH, STEVEN, PAUL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING
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Beschreibung
Zusammenfassung:	This invention provides for compositions, which can be crosslinked by radiation to give elastomeric coatings, which comprises: (a) high-molecular weight siloxanes with multiple (meth)acrylate functional groups; and (b) reinforcing fillers selected from the group consisting of silicone resins and silicone dioxide fillers, wherein the siloxanes (a) have the general structure: [R3SiO1/2]a[(Z)n G-Ym- R2SiO2/2]a'[R2SiO2/2]b[(Z)nG-Ym-RsiO2/2]b'[RsiO3/2]c[SiO 4/2]d, La présente invention se rapporte à des compositions qui peuvent être réticulées sous l'effet d'un rayonnement de manière à produire des revêtements élastomères. Ces compositions comportent: (a) des siloxanes à poids moléculaire élevé possédant de multiples groupes fonctionnels (meth)acrylate; et (b) des charges de renforcement sélectionnées dans le groupe constitué par des résines de silicone et des charges de dioxyde de silicone. Les siloxanes mentionnées en (a) possèdent la structure générale suivante: [R3SiO1/2]a[(Z)nG-Ym-R2SiO1/2]a'[R2SiO2/2]b[(Z)nG-Ym-RsiO2/2]b'[RsiO3/2]c[SiO4/2]d.