OPTICAL LITHOGRAPHY AND A METHOD OF INDUCING TRANSMISSION IN OPTICAL LITHOGRAPHY PREFORMS

The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photol...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BORRELLI, NICHOLAS, F, LOGUNOV, STEPHAN, L, DANIELSON, PAUL, S, HESLIN, MICHAEL, R, MOLL, JOHANNES, SCHERMERHORN, PAUL, M, SMITH, CHARLENE, M
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element including a preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform body into said lithography optical element. L'invention concerne un procédé/système de lithographie à rayons ultraviolets. On utilise une source de rayonnement inférieure à 200 nm, et un élément optique de lithographie en silice fondue à émission photolithique améliorée, pour assurer la transmission des photons au-dessous de 200 nm, de manière à former un schéma de lithographie réduit et projeté sur un support d'impression de lithographie sensible aux rayonnements et donner ainsi un schéma de lithographie imprimé. On fournit l'élément optique susmentionné, comprenant un corps de préforme, et ladite préforme reçoit la configuration de l'élément optique considéré.