SEGMENTING OF PROCESSING SYSTEM INTO WET AND DRY AREAS

A method and apparatus for processing a substrate is described. In one aspect, a processing system is provided which includes a wet area and a dry area. In another aspect, a method comprises processing the substrate in the process cell. The substrate is transferred from the process cell to a dry mod...

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Bibliographische Detailangaben
Hauptverfasser: HEY, H., PETER, W, SUGARMAN, MICHAEL, N, DENOME, MARK
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:A method and apparatus for processing a substrate is described. In one aspect, a processing system is provided which includes a wet area and a dry area. In another aspect, a method comprises processing the substrate in the process cell. The substrate is transferred from the process cell to a dry module and then transferring the substrate to a drying area. L'invention concerne un procédé et un appareil de traitement d'un substrat. Elle concerne en particulier, selon un aspect, un système de traitement comprenant une aire humide et une aire sèche. Selon un autre aspect, elle concerne un procédé consistant à traiter le substrat dans la cellule de traitement. Le substrat est transféré de la cellule de traitement vers un module sec, le substrat étant ensuite transféré vers une aire de séchage.