METHODS OF FORMING MICROSTRUCTURE DEVICES

The invention includes methods of forming microstructure devices. In an exemplary method, a substrate is provided which includes a first material and a second material. At least one of the first and second materials is exposed to vapor-phase alkylsilane-containing molecules to form a coating over th...

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Bibliographische Detailangaben
Hauptverfasser:	LEUNG, TOI, YUE, BECKY, CHINN, JEFFREY, D
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention includes methods of forming microstructure devices. In an exemplary method, a substrate is provided which includes a first material and a second material. At least one of the first and second materials is exposed to vapor-phase alkylsilane-containing molecules to form a coating over the at least one of the first and second materials. L'invention concerne des procédés de fabrication de dispositifs à microstructure. Dans un procédé exemplaire, un substrat comprend un premier matériau et un second matériau. Au moins un de ces matériaux est exposé à des molécules renfermant de l'alkylsilane en phase vapeur, de manière à former un revêtement sur au moins ledit matériau.