DEVICES AND METHODS FOR HIGH THROUGHPUT PATCH CLAMP ASSAYS

A device (10) for measuring electrophysiological properties of a cell membrane of an individual cell comprises a plate (22) provided with at least one opening (58). The opening is bounded by a surface and the surface is modified, such as via heat treatment, to facilitate formation of a gigaseal. A c...

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Bibliographische Detailangaben
Hauptverfasser: MATTHEAKIS, LARRY, COSTAS, KEDAR, HAIM, SAVTCHENKO, ALEXEI, NIKOLAI, KELLY, ANDREW, J., G, NG, KERWIN
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:A device (10) for measuring electrophysiological properties of a cell membrane of an individual cell comprises a plate (22) provided with at least one opening (58). The opening is bounded by a surface and the surface is modified, such as via heat treatment, to facilitate formation of a gigaseal. A chamber (46) is adjacent to the plate. The chamber is in fluid communication with at least one opening and is adapted to hold an electrically conductive solution. The plate further comprises a first electrode (36) located in the chamber and a second electrode (28) located adjacent to the plate. A device for measuring electrophysiological properties of a cell membrane of an individual cell comprises a plate provided with at least one opening. The opening is bounded by a surface and the surface is modified, such as via heat treatment, to facilitate formation of a gigaseal. A chamber is adjacent to the plate. The chamber is in fluid communication with at least one opening and is adapted to hold an electrically conductive solution. The plate further comprises a first electrode located in the chamber and a second electrode located adjacent to the plate. L'invention concerne un dispositif destiné à mesurer les propriétés électrophysiologiques d'une membrane cellulaire d'une cellule individuelle comprenant une plaque comportant au moins un orifice. L'orifice est limité par une surface et cette surface est modifiée, notamment via un traitement thermique, afin de faciliter la formation d'un scellement à résistance très élevée (gigaohm). Une chambre est située adjacente à la plaque. La chambre est en communication libre avec au moins une orifice et elle est conçue pour contenir une solution conduisant l'électricité. La plaque comprend, en outre, une première électrode disposée dans la chambre et une seconde électrode disposée adjacente à la plaque.