REUSABLE MASK AND METHOD FOR COATING SUBSTRATE
A mask article (12) and method of coating are provided whereby coating is deleted from one or more portions of a substrate like transparencies during a coating operation. The mask is a semi-rigid device having two major generally opposing surfaces (14, 16) and one or more sides (18) between such sur...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A mask article (12) and method of coating are provided whereby coating is deleted from one or more portions of a substrate like transparencies during a coating operation. The mask is a semi-rigid device having two major generally opposing surfaces (14, 16) and one or more sides (18) between such surfaces with at least one one-piece edge. The side(s) slope inward toward the interior of the solid part of the mask at an angle from the horizontal plane of the larger major surface (14) of the mask up to the slope of the side from greater than 0 DEG to less than 90 DEG . This inward slope is somewhere along the side between the larger major surface and the smaller major surface (16). The sloping segment of the side should extend a distance sufficient to provide an adequate edge at the mask-coating-substrate interface to reduce the ghosting effect. The surface area of the larger area surface has the configuration of the shape of a deletion for the coating. The mask is adapted for secure placement on the substrate during the coating process and removal therefrom after the coating process. This is accomplished either by the weight of the mask itself or from the use of at least one friction enhancing member (34, 36, 38) present on the mask. With the presence of friction enhancing member(s) on the mask, recesses (28, 30, 32) are also optionally provided on the mask. The number, size, configuration and location of the recesses and friction enhancing members assist in the stackability of a plurality of the masks. After one or more coatings are applied to the masked substrate, the masks can be removed and conveyed to the beginning of coating operation to mask other substrates. After a number of such cycles the masks can be cleaned of coating and reused.
L'invention concerne un masque (12) et un procédé de revêtement, le revêtement étant supprimé d'une ou de plusieurs parties d'un substrat comme transparences au cours d'une opération de revêtement. Le masque est un dispositif semi-rigide comportant deux surfaces (14, 16) principales généralement opposées, et un ou plusieurs côtés (18) situés entre ces surfaces et présentant au moins un bord en une seule pièce. Le(s) côté(s) est/sont incliné(s) vers l'intérieur en direction de la partie solide du masque selon un angle s'étendant du plan horizontal de la surface (14) principale la plus grande du masque à la pente du côté, supérieur à 0 DEG et inférieur à 90 DEG . Cette partie inclinée dirigée vers l'intérieur se trouve sur |
---|